Product Information
Coater
Vacuum Dryer
This machine is for drying in the vacuum state of the substrate after coating.
Application
Drying after the resist coating（VCD）
Baking process
Characteristics
- By switching 2 exhausts, slower and main exhaust, it reduces occurrence of wind ripple and foam on the substrate.
- By drying at room temperature, it is possible to dry with reduced unevenness on pin support spots.
- By drying under reduced pressure, it is possible to shorten the time of the bake process.