Large mask processors

Photomasks that form circuit patterns in response to increasingly larger displays are also becoming larger. This is a machine that performs development processing and Etching after exposing a pattern to a resist applied on a photomask.
The mask processor consists of a loader/unloader, a carrier, a spin developer, and a spin etcher.

Characteristics

Compatible with AGV and MGV

Multiple sizes can be set. (Please contact us regarding mask size.)

Slit nozzle adopted

Machine specification